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Materials

Electron beam lithography, a helpful tool for nanooptics

Beteiligte Autoren der JOANNEUM RESEARCH:
Autor*innen:
Hohenau, Andreas; Ditlbacher, Harald; Lamprecht, Bernhard; Krenn, Joachim R.; Leitner, Alfred; Aussenegg, Franz R.
Abstract:
Nanooptics, in particular optics with nanometric metal structures is currently a fast developing field of science, motivated by the prospects of good integrateability to microelectronics. In the following, we give a short introduction to the field of nanooptics and its link to microelectronics and we discuss the importance of e-beam lithography for the fabrication of nanooptical elements. Two examples of a possible advantageous application of nanooptical elements are given: Spectrally coded data storage and light guiding by sub-micron metal structures.
Titel:
Electron beam lithography, a helpful tool for nanooptics
Seiten:
1464-1467
Publikationsdatum
2006

Publikationsreihe

Nummer
83
Beitrag
4
ISSN
0167-9317
Proceedings
Microelectronic Engineering

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