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Inkjetable and photo-curable resists for large-area and high-throughput roll-to-roll nanoimprint lithography

Contributing authors of JOANNEUM RESEARCH:
Authors
Thesen, Manuel W.; Nees, Dieter; Ruttloff, Stephan; Rumler, Maximilian; Rommel, Mathias; Schlachter, Florian; Grützner, Susanne; Vogler, Marko; Schleunitz, Arne; Grützner, Gabi
Title:
Inkjetable and photo-curable resists for large-area and high-throughput roll-to-roll nanoimprint lithography
Seiten:
043003
Publikationsdatum
2014

Publikationsreihe

Nummer
13
Beitrag
4
Proceedings
Journal of Micro/Nanolithography, MEMS, and MOEMS

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