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Reductive Photopatterning of Phenylene-Vinylene-Based Polymers
Contributing authors of JOANNEUM RESEARCH:
Authors
Kavc, T.; Langer, G.; Kern, W.; Ruplitsch, A.; Mahler, K.; Stelzer, F.; Hayn, G.; Saf, R.; List, E. J. W.; Zojer, E.; Ahmed, M. T.; Pogantsch, A.; Iskra, K. F.; Neger, T.; Hörhold, H.-H.; Tillmann, H.; Kranzelbinder, G.; Toussaere, E.; Jakopic, G.
Abstract:
Photochemical methods were developed to obtain a variation of the refractive index in aromatic polymer surfaces and a change in the photoluminescence characteristics of phenylene-vinylene-based polymers. Films of aromatic polymers, among them polystyrene (PS), poly(2-vinylnaphthalene) (PVN) and derivatives of poly(-phenylene-vinylene) (PPV) were UV irradiated in the presence of gaseous hydrazine (N2H4). The photoreaction led to a strongreduction of the refractive index of the polymers due to a hydrogenation of the aromatic units. In the case of PPV, we observed reductive photobleaching. This new technique was employed to produce photogenerated patterns in PPV. The results are compared to oxidative bleaching.
Title:
Reductive Photopatterning of Phenylene-Vinylene-Based Polymers
Seiten:
11311131
Publikationsdatum
2002
Publikationsreihe
Nummer
707
Beitrag
1
ISSN
1946-4274
Proceedings
MRS Online Proceedings Library
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Jahr/Monat:
2002
