Surface Characterisation Lab

We use a specially modified EVG770 Nanoimprint Lithography (NIL) stepper for the large-scale production of micro- and nanostructures in UV imprint resins. Together with special materials and processes, we achieve the highest precision right down to practically seamless transitions between individual structures.

Certified class 6 cleanroom for nanostructures and innovative electronic components and sensors

Microassembly Lab for photonic and electronic assemblies

This highly precise maskless laser system (MALA) is suitable for the production of highly complex and stepless micro-optical structures.

The lab includes flexible, rapid prototyping processes to produce a variety of structures in a wide range of materials.

We offer laser material processing and many years of expertise in materials science.

State-of-the-art development infrastructure for integrated electronic and optical design including EMC and ESD - open to industrial partners.

Our R2R-UV-NIL pilot line enables the continuous and cost-effective production of micro and nanostructures on flexible large-area film substrates for applications in lighting, photovoltaics, AR/VR, AR/VR, microfluidics, diagnostics, security, film finishing and packaging, the pharmaceutical industry and life sciences.

State-of-the-art infrastructure for light measurement and prototype production for integrated optical and electronic design - open to industrial partners.

Our laboratory includes technologies for functional plasma coating at low temperatures from atmospheric pressure to fine and high vacuum.

Printing technologies for the development of customised 2D, 2.5D and 3D printing processes